Presentation Abstract

Session: Nonablative Direct-Write Processing
Tuesday, May 18, 2010, 8:00 AM - 9:45 AM
Presentation Type: CLEO Invited
Presentation: JTuA1 - High Resolution 3-D Laser Direct-Write Patterning
Pres. Time: Tuesday, May 18, 2010, 8:00 AM - 8:30 AM
Location: Room C3&4
Category: CLEO 01: Laser Processing of Materials: Fundamentals and Applications
Author(s): Linjie Li, Rafael R. Gattass, Michael Stocker, Erez Gershgoren, Hana Hwang, John T. Fourkas; Univ. of Maryland, USA.
Abstract: Resolution Augmentation through Photo-Induced Deactivation (RAPID) lithography makes possible the creation of features that far smaller than the wavelength of light employed. We will present some of the latest advances in RAPID lithography.



Technical Support:
Email: cstech@osa.org
Phone: 202-416-6191