Nonablative Direct-Write Processing
Tuesday, May 18, 2010, 8:00 AM - 9:45 AM
High Resolution 3-D Laser Direct-Write Patterning
Tuesday, May 18, 2010, 8:00 AM - 8:30 AM
CLEO 01: Laser Processing of Materials: Fundamentals and Applications
Linjie Li, Rafael R. Gattass, Michael Stocker, Erez Gershgoren, Hana Hwang,
John T. Fourkas
; Univ. of Maryland, USA.
Resolution Augmentation through Photo-Induced Deactivation (RAPID) lithography makes possible the creation of features that far smaller than the wavelength of light employed. We will present some of the latest advances in RAPID lithography.
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