Presentation Abstract

Session: Nonablative Direct-Write Processing
Tuesday, May 18, 2010, 8:00 AM - 9:45 AM
Presentation Type: CLEO Invited
Presentation: JTuA1 - High Resolution 3-D Laser Direct-Write Patterning
Pres. Time: Tuesday, May 18, 2010, 8:00 AM - 8:30 AM
Location: Room C3&4
Category: CLEO 01: Laser Processing of Materials: Fundamentals and Applications
Author(s): Linjie Li, Rafael R. Gattass, Michael Stocker, Erez Gershgoren, Hana Hwang, John T. Fourkas; Univ. of Maryland, USA.
Abstract: Resolution Augmentation through Photo-Induced Deactivation (RAPID) lithography makes possible the creation of features that far smaller than the wavelength of light employed. We will present some of the latest advances in RAPID lithography.


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